Vacuum Deposition

Precious metals are frequently utilised in evaporation processes. During evaporation, materials such as platinum, gold, or silver are vaporised in a vacuum environment. This vapor then condenses onto another surface, forming a thin film or coating.

Applications: Sputtering targets or pellets are versatile tools for creating thin film depositions (coatings) of precious metals. Two notable methods for these applications are Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD).

• Chemical Vapor Deposition (CVD) is essential for producing wafers, which are often used as the foundational material for semiconductor products like integrated microchips.
• Physical Vapor Deposition (PVD) is widely employed in producing coatings for various industrial and commercial uses. PVD encompasses several techniques, including:
  • Evaporation
  • High Power Impulse Magnetron Sputtering (HIPIMS)
  • High Target Utilization Sputtering (HiTUS)
  • Ion Beam Sputtering (IBS)
  • Reactive Sputtering

At Cookson Industrial, we offer an extensive range of precious metal equipment for use in thin film depositions (coatings) of precious metals.

Purpose of Applying a Thin Film Layer of Precious Metal: Applying a thin film layer of precious metal to a surface serves multiple functions. It enhances the surface’s durability and scratch resistance, which is vital for applications requiring high wear resistance. It can also modify the surface’s electrical conductivity, either increasing or decreasing it according to the specific needs of the application. Furthermore, this layer improves the surface’s thermal conductivity, making it more resistant to high temperatures—an important feature in extreme heat environments. Lastly, this treatment can optimize signal transmission, either enhancing or reducing it, which is particularly crucial in the electronics and communications sectors.

We can also develop customised products tailored to your needs. For further information, please do not hesitate to contact us.